MEMS and Nanotechnology, Volume 2

uniformity increased during the course of an experiment due to the change in the sample resistance because of strain localization and local reduction in the mid-specimen thickness where the temperature was the highest. As shown in Figure 4(a) the temperature profile was highly non-uniform in the beginning of an experiment with the temperature in the gauge section ranging between 50-110 ˚C. There is no significant change in temperature distribution during the early stages of the experiment. Thus, the small but gradual change in local electrical resistance during the course of an experiment did not affect the temperature distribution along the gauge section. (a) (b) Figure 4. IR intensity images and temperature distributions along the specimen axis of symmetry for resistively heated Au thin film specimens subjected to uniaxial tension. (a) (b) Figure 5. Axial strain distribution along a resistively heated Au thin film specimen. Full-field strain measurements were conducted under an optical microscope at 20× magnification and were compared with the temperature distributions in Figure 4. As shown in Figure 5(a), a fairly uniform strain field 177

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